Other TF deposition techniques part 3 Arno Smets PVMD Delft University of Technology
Atomic layer deposition C 1. C Al C Al Al Al C Al C C C C Al C Al C C Al C C Al Al Al O O O O Substrate Heater
Atomic layer deposition C 1. C Al C N 2. N N N N Al N Al C N C N N N N N C N N N N N N C N N N N N C N N N N N N N Al Al Al N N O O O O N N Substrate Heater
Atomic layer deposition C 1. C Al C O O O 2. O N N O O O O O O O O O O O O O O O O O O O 3. O O O O O O O O O O Al Al Al O O O O O O O O Substrate Heater
Atomic layer deposition C 1. C Al C O O N O 2. N N N N O O N O O N N N N O N N O O N O N N N N N N N 3. N O O N N N O O O N N N N N N Al Al Al O O O O N N O O O O N N 4. N N Substrate Heater
Spin coating Solvent Target Substrate
Spin coating
Plasma enhanced CVD Chemical bath deposition Silicon alloys Cadmium sulphide Molecular beam epitaxy Sputtering deposition III-V alloys TCO’s Metallic layers Chalcogenides Metal-organic CVD Evaporation deposition III-V alloys Metallic layers Atomic layer deposition Ultra-thin, uniform layers Close space sublimation Spin coating Cadmium telluride Organic PV
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