prototype for It-fab Lorenza Ferrario, FBK and It-fab Summary - PowerPoint PPT Presentation

How to support the access of new users in distributed research infrastructures: a first prototype for It-fab Lorenza Ferrario, FBK and It-fab

Summary • It-fab – outline of the ENL Italian network • Building the It-fab technology and know-how repository • Virtual access to It-fab – a demo tool • Data management according to FAIR principles • Conclusions and future work

Italian network implementing the ENL Italian node

The Micro and Nano Facility FBK http://mnf.fbk.eu http://cmm.fbk.eu Microfabrication Testing Material characterization 0.8 micron “CMOS like” Electrical and functional SIMS cleanroom, 500 sq. (optic, gas, solar ToF-SIMS meters efficiency) on wafer PTR-MS Si-MEMS cleanroom, testing, manual and XPS 100 sq. meters automatic probes XRD, XRF package area SEM+EDX AFM Nanofabrication by e- RAMAN beam lithography Strengthening Nanofabrication – FESR investments ISO 9001-9015 Certification

Devices developed at MNF Microresonators Silicon Photomultipliers Microheaters Single and Double Side (for gas sensing) RF-MEMS Microstrip

• Several thousands of sqm of cleanrooms • Advanced sensor and material technologies • Excellence in nanomaterials, analysis, characterization • Several hundreds of users: reserachers, technicians, Students, PhDs, post-doc, ERCs • Interaction with RTOs, Universities and Companies • ENL benchmarking: in progress

(i) establishment of harmonized rules, for clean room management and access policies, IP rules, external costs and reporting; (ii) harmonization and sharing of design and simulation software, service contracts, management of professional services; (iii) definition of joint best practices for reciprocal support and backup, complementarities, standardization of clean room practices, interoperability and data exchange formats; (iv) definition of common information system for know-how, projects and equipment databases;

Acting as an attractive open research infrastructure, coherent with ENL aims • Let people know what It-fab can do • Better communication and coordination among partners • Access rules, tariffs • Training schema (safety, quality) • Supporting users during process requirement definition

Management execution system

Management execution system

Some interactions with It-fab Resources DB: Technology Equipment Access and training policies Tariffs Processing: external users Sensor process flow Temporary backup It-fab partners Optimized decisions about new equipment

Information sharing Personal contacts web pages Schools, conferences, workshops A single It-fab entry point  Structuring questions and answers  pre-processing users requests  addressing the requests according to

Information groups Technology ISO class Policies Equipment State of the Compatibility Access rules Materials resources rules costs Processes

Relational DB prototype

In progress sw tool It-fab virtual infrastructure DB direct access Query tool Operation required: Equipment Adding/removing/patterning/mea DB suring/thermal process Starting from: Material DB Blank wafer/Processed wafer/Other item (sample, wafer Laboratories quarter,…) DB Access Item history: what seen Policies before? What on the top?

DEMO

DEMO

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DEMO

emulator AppProcessComposer Lithographics Mask Fab Modification Deposition Processes Processes

FAIR , OpenData, OpenScience FAIR principles Findable Accessible Interoperable Reusable • Associated to unique identifier • Well structured • Findable by common and open protocols – http, ftp • Consistent • Suited to reuse, and machine processing • ….. http://www.go-fair.org

Protein archives URI http://www.uniprot.org/uniprot/P98161

An exampple: XML equipment description <it-fabDB xmlsl=https://www.it-fab.org/equipment/ ….> <id> P002L001E001</id> Table format <equipment> <equipmentUniqueId>P002L001E001</ equipmentUniqueId > equipmentId equipmentName processGroup handling forbiddenMaterials furtherInformation state decontaminationProcedures parameters P001L001E003 RTP atmospheric thermal process 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 none P001L002E001 Alcatel DRIE DRIE 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 ashing <equipmentName>AMS200 DRIE</equipmentName> Available gases: O2, SF6, C4F8, CH4, Ar Pressure ~10E-2 mbar Flows: O2 0-200 sccm; C4F8 0-400sccm; SF6 <equipmentProcessGroup>DRIE</equipmentProcessGroup> 0-1000 sccm; He 0-200sccm, Ar 0-200 sccm, N2 0-1000 sccm, CH40-100 sccm Source generator 0-3000 W <equipmentHandling>6</equipmentHandling> Bias power 0-300 W P002L001E001 AMS200 DRIE DRIE 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 0 Chuck temperature -12 - +20 ºC P002L001E002 Tegal903 <forbiddenMaterials>Au,Cu,K</forbiddenMaterials> plasma sample,4,6 https://mnf.fbk.eu/infrastructure 0 chamber and handling cleaning P002L001E003 SPTS PECVD plasma sample,4,6 https://mnf.fbk.eu/infrastructure 1 chamber and handling cleaning P002L001E004 Eclispe MRC IV PVD 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 <exendedInfo>mnf.fbk.eu</extendedInfo> P002L001E005 Centrotherm OX3 atmospheric thermal process 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 P002L001E006 Centrotherm LPCVD TEOS LPCVD 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1 P002L001E007 Track SVG 8600 coating and developing 6 https://mnf.fbk.eu/infrastructure 2 <equipmentState>1</equipmentState> <equipmentCleaningProcedures>ashing</equipmentCleaningProcedure> <equipmentParameters> <processGas>O2, SF6, C4F8, CH4, Ar</processGas> <chamberPressure unit=” mBar ”> 10e-2</chamberPressure> <sourceGeneratorPowerMin unit=” W ”> 0</sourceGeneratorPowerMin> <sourceGeneratorPowerMax unit=” W ”> 3000</sourceGeneratorPowerMax> <biasPowerMin unit=” W ”> 0</biasPowerMin> <biasPowerMax unit=” W ”> 300</biasPowerMax> <chuckTemperatureMin unit=” oC ”> -12</chuckTemperatureMin> <chuckTemperatureMax unit=” oC ”> 20</chuckTemperatureMax> </equipmentParameters> </equipment>

Conclusions It-fab as Open RI Documentation and tools to enable more and better use of the infrastructure Future work on the virtual process sw: • Keep developing: adding etching, doping and patterning to the process validators • Enhancing the checking algorithms to better address process flow building • Further work on the FAIR data analysis Feedback and inputs from outside It-fab

Thanks for your attention! Lorenza Ferrario, ferrario@fbk.eu