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DeePattern: Layout Pattern Generation with Transforming Convolutional Auto-Encoder Haoyu Yang 1 , Piyush Pathak 2 , Frank Gennari 2 , Ya-Chieh Lai 2 , Bei Yu 1 1 The Chinese University of Hong Kong 2 Cadence Design Systems, Inc. 1 / 16 <latexit

  1. DeePattern: Layout Pattern Generation with Transforming Convolutional Auto-Encoder Haoyu Yang 1 , Piyush Pathak 2 , Frank Gennari 2 , Ya-Chieh Lai 2 , Bei Yu 1 1 The Chinese University of Hong Kong 2 Cadence Design Systems, Inc. 1 / 16

  2. <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> EUV Brings Challenges in DFM Process Technology ( µm ) <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> <latexit sha1_base64="1XOQUpYJ4Navgj2rMp+JfrNOobQ=">AB7nicbVA9TwJBEJ3DL8Qv1NJmI5hYkTsaLElsLDERMIEL2VsW2LC7d9mdMyEXfoSNhcbY+nvs/DcucIWCL5nk5b2ZzMyLEiks+v63V9ja3tndK+6XDg6Pjk/Kp2cdG6eG8TaLZWweI2q5FJq3UaDkj4nhVEWSd6Pp7cLvPnFjRawfcJbwUNGxFiPBKDqpW+2rlKjqoFzxa/4SZJMEOalAjtag/NUfxixVXCOT1Npe4CcYZtSgYJLPS/3U8oSyKR3znqOaKm7DbHnunFw5ZUhGsXGlkSzV3xMZVdbOVOQ6FcWJXfcW4n9eL8XRTZgJnaTINVstGqWSYEwWv5OhMJyhnDlCmRHuVsIm1FCGLqGSCyFYf3mTdOq1wK8F9/VKs5HUYQLuIRrCKABTbiDFrSBwRSe4RXevMR78d69j1VrwctnzuEPvM8fNUyOxg=</latexit> µm 10 1 0.1 0.01 10,000,000,000 A12 A7 Core i7 1,000,000,000 Core 2 Duo Intel Microprocessors A10 A11 Number of Transistors per Integrated Circuit Pentium 4 Apple Microprocessors 100,000,000 Pentium II 10,000,000 486 Pentium 1,000,000 386 Invention of the 286 100,000 Transistor 8086 Doubles every 2.1 yrs 10,000 4004 1,000 100 10 1 1940 1950 1960 1970 1980 1990 2000 2010 2020 Year ◮ Hotspot detection and fix ∗ ◮ Early technology node development ◮ Design rule, OPC recipe development, ... ∗ Harry J Levinson and Timothy A Brunner (2018). “Current challenges and opportunities for EUV lithography”. In: Proc. SPIE . vol. 10809. 2 / 16

  3. Related Works (a) (b) (c) ◮ Transferring from previous technology node (not applicable for large technology node gap † ) ◮ Randomly placing patterns according to certain constraints (limited diversity) ◮ Generative machine learning models (violating design rules) † Linda Zhuang et al. (2016). “A novel methodology of process weak-point identification to accelerate process development and yield ramp-up”. In: Proc. ICSICT , pp. 852–855. 3 / 16

  4. Pattern Generation Challenges Satisfying design rules Pitch T2T Width Length Coverage of the design space ◮ The complexity of a pattern in x and y directions (denoted as c x and c y ) are defined as the number of scan lines subtracted by one along x -axis and y -axis, respectively. ◮ The diversity of a pattern library is given by the Shannon Entropy of the pattern complexity sampled from the library, � � H = − P ( c xi , c yj ) log P ( c xi , c yj ) , i j where P ( c xi , c yj ) is the probability of a pattern sampled from the library has complexities of c xi and c yj in x and y directions respectively. 4 / 16

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