Webinar ALD Basics: ALD on Powders December 19 th , 2019 dhiggs@forgenano.com smoulton@forgenano.com
A LITTLE BIT ABOUT US Founded in 2013 30 Employees 1,500 m 2 facility in Louisville, CO, USA Expansion in 2020 Mission: To become the world leader of innovative materials solutions We are your global ALD experts!
INVESTORS
MIKE TALARICO, INBOUND MARKETING LEAD Role: To create the fun and engaging learning tools that help our partners develop an understanding and appreciation for the possibilities of ALD on powders and its underlying technology. Experience: NOT AN ALD EXPERT 15 years of Marketing experience 10 years International Marketing management 15 years production and event management Enjoys: Long walks on the beach, the way the air smells after it rains. Drawing, sculpting, anything creative, spending time with my wife and kiddos.
STACI MOULTON, PHD, MBA, APPLICATION ENGINEER Role: To help you get up to speed on what is possible and what is not possible with ALD including the likelihood of commercial viability for your product and the path required to get there. Experience: - PI ARPA-E ALD projects for catalysis and commercial opportunities - I-CORP Program for Lean Launch Process - 10 years experience in ALD on powders Education: Ph.D. Chemical Engineering, CU Boulder (Prof. Al Weimer) MBA, CU Denver B.S. Chemical Engineering, Oregon State University Enjoys: Recreational Aviation, Sailing, Travel, Family Time, Ranching
DANIEL HIGGS, PHD, BUSINESS DEVELOPMENT MGR Role: To work with you on structuring and implementing a commercially-focused joint development project to move from proofs of concept to products. Experience: - 10 years in ALD/MLD/ALE field - Inventor of multiple ALD process and system patents - Entrepreneurship and technical business development Education: Ph.D. Chemistry, Uni. of Colorado Boulder (Prof. Steven George) MBA, University of Colorado Denver. Enjoys: Gardening, cooking, traveling, languages, jazz trumpet, and tea.
AGENDA • ALD on powders (Staci) • ALD at scale (Staci) • Example applications (Daniel) • How you can work with Forge Nano (Daniel) • Q & A
STACI MOULTON ALD ON POWDERS ALD AT SCALE
ATOMIC LAYER DEPOSITION: THE BASICS ALD is all about the sequential deposition of thin films atom omic ic layer er by atom omic ic layer er Purge Purge Pulse A Pulse A Pulse B Pulse B
ATOMIC LAYER DEPOSITION: THE BASICS Based on sponta ontaneous neous, sequential, sel elf-li limi miti ting ng thermal reactions that add material with atomic level control Vervuurt, R.H.J., Kessels, W.M.M.E., and Bol, A.A. (2017) Adv. Mater. Interfaces , 1700232 , 1700232
TIMELINE FOR WAFER ALD 3D structures and $ area-selective ALD Pilot production of 2.3 TFEL displays billion $$ 600 Principal of million $$ “molecular layering” first Interest in proposed in 100 semiconductor Russia million $$ ALD 1970 2003 2023 1952 2013 1983 1985 1990 ALD developed for ALD scale down TFEL displays (Finland) microelectronic devices
NANO-COATING TECHNOLOGIES ALD offers more control than any other coating technology
WHY ARE SURFACE COATINGS IMPORTANT? Many important chemical processes rely heavily on interfacial interactions. By tuning the surface we can tune the material behavior… -Defect passivation -Barrier to moisture/oxygen -Corrosion resistance -Surface functionalization -Optical enhancement -Porosity control … for stronger performance and higher efficiency.
ALD COATING CHEMISTRY TOOLKIT Growth in available precursors spurred by semiconductor industry ALD Materials Inorganic Materials • Metals • Oxides • Nitrides • Sulfides • Selenides • Tellurides • Phosphates Organic Polymers (MLD) Hybrid Inorganic/Organic Mixtures Many coating types available – applicable to nearly any substrate
FORGE NANO’S COATING TYPE EXPERIENCE Forge Nano Direct Experience Forge Nano Applicable Experience Coatings Substrates Coatings Substrates • AlO x , TiO x , SnO x , LiO x , Catalysts translation Metals Geldar class powders (A-D) • ZnO x , NbO x , TiNb x O y , (powders, pellets) (aeratable, sand-like, Oxides • AlP x O y , MgO x , LiP x O y N z , Metals cohesive, and spoutable) Nitrides • LiNb x O y , CoO x , TiP x O y , Cathode Phosphates • LiP x O y , BO x , CeO x , LiAl x O y , Anodes Nano-materials MLD • Sn(PO4) x , ZrO x , MgAl x O y , Solid electrolytes Multilayer SiO x , NiO x , Pt, Pd, CeZr x O y , (powders and plates) Objects (flats/foils, • BiO x , DyO x , TiN x , Alucone, Thermal fillers membranes, sponge-like, • titanicon, tincone Base metals and porous) *Proprietary coatings and substrates not listed **Coating experience by organizations outside Forge Nano not listed Both precursor and process design are expanding available coating space
ATOMIC LAYER DEPOSITION: THE BASICS Deposits co conform ormal al, uniform, pin-hole free films on surfaces of all shapes and sizes
ATOMIC LAYER DEPOSITION: THE REAL DEAL Deposits on all shape apes and sizes Multilayers Critical Thickness Nano-Islands =1000 ALD Layers Disperse Nano-Islands within layers ALD is a highly controllable very thin film process for engineering surfaces
NOT ALL “NANO” COATINGS ARE EQUAL Sol Gel Sol Gel ALD ALD Sub-nanometer control • Uniform • Conformal • Multi-layer interfaces • Only ALD can deposit one atomic layer at a time
TIMELINE FOR PARTICLE ALD Particle ALD Invented in Revival of Russia Particle ALD Research 1964 1992 2011 2000 Forge Nano Fluidized Bed ALD demonstrates high- implemented in throughput particle Europe ALD Particle ALD is 15 years behind wafer ALD – a Billion – dollar industry
REIMAGINING PARTICLE ALD Gas Out Temporal ALD (Batch): Precursors are separated in time rather than in space Powder stays in one fixed reactor, precursors are alternately exchanged Precursor A Advanta antages ges: : Versatility Purge Precursor B Disadv advantage antages: : Difficult to scale, low production rate, Gas In low yield and inefficient operation mode Purge
FLUIDIZATION
REIMAGINING PARTICLE ALD Spatial Particle ALD (Semi-continuous): Precursors are separated in space rather than in time Powder moves between reaction zones, precursors are fixed in Precursor A space Purge Advanta antages ges: : High production rate, high yield and high manufacturing Precursor B efficiency Purge Disadv advantage antages: : Loss of versatility
SEMI-CONTINUOUS SINGLE VS CONCURRENT BATCH Substrate materials move and the gases are fixed in space Advanta antages ges: : Precursor utilization, speed, high production rate and efficiency Disadv advantage antages: : Versatility, cost scales with ALD cycles Synchronized controls and powder movement increases manufacturing efficiency --> continuous processing Semi-continuous is the only demonstrated high-throughput particle ALD system
STATE OF DEVELOPMENT Commercial Pilot Prototype Fluidized Bed Q3 2013 Q3 2015 Q1 2017 Q1-2020 Broomfield, CO Louisville, CO New Facility (TBD) >25 tons / day 2 Scale of Production 72 kg / day 200 kg / day 2.5 tons / day $1,000/kg <$1/kg Cost of Production 1 1. Typical cathode material with alumina coating, 2. 10k MT systems for customer site installation Throughput is directly linked to cost
INNOVATION ROADMAP FOR PARTICLE ALD Com ommer ercial cial-sc scal ale: : 100 kg – 3 ton tons Pilot-scale ale: : 10 - 100 kg Lab-scale ale: : ~1 mg to to 1 kg Process innovation & materials innovation
TIMELINE FOR PARTICLE ALD 10000 ALD has been around for decades, not adopted because to expensive ▪ ton/yr No previous innovation around scale-up until 2011 ▪ 1000 ton/yr 30 Revival of ton/yr Particle ALD 10 Particle ALD Invented in ton/yr Research Russia 1 ton/yr 1992 2020 1964 2013 2014 2018 2000 2011 2012 Forge Nano Fluidized Bed ALD demonstrates high- implemented in throughput particle Europe ALD New spatial ALD process enables high-throughput in recent years
PARTICLE ALD NEEDS HIGH THROUGHPUT TECHNOLOGY Develo lopment ment Catalysts En Energy y Stor Storage ge Resear arch ch Particle ALD
DANIEL HIGGS, PHD, BUSINESS DEVELOPMENT MGR EXAMPLE APPLICATIONS HOW YOU CAN WORK WITH FORGE
EXAMPLE APPLICATIONS
ALD ON POWDERS APPLICATION SPACE #1 #2 #3 #4 #5 Energy Storage Catalysts Fillers Powder Forming Separations LIB, Beyond Li, Emissions, Thermal, Optical, 3D Printing, Powder Adsorbents, Capacitors, Materials Chemicals, Fuel Cells Electrical, Mechanical Metallurgy, Ceramics Membranes Space Barrier Coatings Multi-faceted, Corrosion, Anti- Cross-cutting fouling, Wettability Textiles Pigments Anti-microbial, Paint, Dispersion, Special Properties Optical Properties Cosmetics Power Gen Processing, Solar Performance Pharma Medical Devices Lubricants Displays Structural Biocompatibility, LCD, OLED, QLED Controlled Release, Tribology, Rheology, Composites, Processing Energy Storage Dry & Wet Lubricants Building, Glass ALD is a platform technology that can service a diverse set of applications
ALD FOR BATTERIES
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