New Electrostatic Separator for K1.8 Beam Line Design Guideline ・ Radiation hardness ・ Reduce unexpected electric discharge Improvement and optimization on ... - Vacuum Chamber - Electrode - C.W. HV generator - Assembling Beam Instrumentation Workshop 2007.5.11 by M.Minakawa & M.Ieiri 1
Separator -1 真空容器 T1 p 平行電極(-)側 π - - ) 軽い粒子( K- 選択粒子(K - ) 磁場 電場 p-bar 重い粒子(p-bar) 平行電極(+)側 2
Separator -2 y = eEl 2 y ' = eEl pc β 2 pc β Δ y ' = eEl 1 − 1 1 eEl 2 − m U ( ) 2 p 3 c 3 m W ≈ pc 2 β W β U E = 75 [kV /cm] y’ : π 25.08 [mr] l = 6 [m] K 25.92 [mr] p = 1.8 [GeV /c] p 28.19 [mr] π -K vertical displacement at MS : 3.5 [mm] 3
Separator -2 y = eEl 2 y ' = eEl pc β 2 pc β Δ y ' = eEl 1 − 1 1 eEl 2 − m U ( ) 2 p 3 c 3 m W ≈ pc 2 β W β U E = 75 [kV /cm] y’ : π 25.08 [mr] longer l : Kaon decay l = 6 [m] K 25.92 [mr] larger E : stability, transmission efficiency p = 1.8 [GeV /c] p 28.19 [mr] sharp vertical image at MS : small acceptance (secondary beam intensity) π -K vertical displacement at MS : 3.5 [mm] 3
Separator -3 @K2 4
φ695.2 Drawing-out note Metal O-ring Electropolishing Buffing & φ800 Welding max. R11 Mechanical Buffing Rubber O-ring Vacuum Chamber-1 item KEK-PS J-PARC O.D. of Chamber JIS750-standard Junction of relieve local field branch pipes ≥ R30 reducing electric Polishing discharge Vacuum seal radiation-hard 5
Vacuum Chamber-2 6
Drawing-out Vacuum Chamber-2 6
five-face processing Drawing-out Vacuum Chamber-2 6
five-face processing Drawing-out Vacuum Chamber-2 6
KEK-PS J-PARC Smaller figure of Vacuum Chamber ( φ 800→φ695.2) ・Ceramic-base length:198mm→154mm ・Distance btwn Electrode & Chamber:115mm→76mm Electrode-1 7
(t=5, R1=3, R2=2 [mm]) Max. E:2.11×107 [V/m] Electric field around rim → Thickness and R of Anode(SUS) J-PARC (t=10, R1=8, R2=2[mm]) Max. E:1.63×107 [V/m] KEK-PS Electrode-2 Cathode Anode (Cathode-side) Gap for ES-field R1 Anode(SUS) t R2 8
Connection Electrode-3 K2 J-PARC 9
Connection Electrode-3 K2 J-PARC 9
J-PARC KEK-PS CW-HV Power supply -1 高電圧発生 装置本体 絶縁油 セラミック容器 電 圧 導 入 部 真空容器 負電極 10
J-PARC KEK-PS CW-HV Power supply -1 高電圧発生 装置本体 絶縁油 セラミック容器 電 圧 導 入 部 真空容器 負電極 10
J-PARC KEK-PS CW-HV Power supply -1 高電圧発生 装置本体 絶縁油 セラミック容器 電 圧 導 入 部 真空容器 負電極 10
CW-HV Power supply -2 11
CW-HV Power supply -2 11
CW-HV Power supply -2 ガス圧 - 耐電圧 特性曲線 印可電圧 [kV] 正極 06.01.05 400 正極 06.01.06 正極 06.01.10 正極 06.01.11 正極 06.01.12 負極 06.05.17 350 負極 06.05.19 負極 06.05.18 300 250 200 10 -5 10 -4 He-Ne ガス 導入圧力 [Torr] 11
Assembling-1 12
Assembling-1 12
Assembling-2 13
Assembling-3 14
Assembling-3 14
Assembling-3 14
Assembling-4 15
Assembling-4 15
Assembling-5 16
Assembling-6 17
Assembling-6 17
Assembling-6 17
真空容器・電極・高電圧発生装置を設計/製作 K1.8ビームライン用の6m長初段ESSの組上げ 設計の指針 放射線耐性 電界の緩和 今後 実機としての真空試験、電圧印可試験、連続運転試験 設置ベースの設計製作 二段目のESS(K6セパレータ)の整備 まとめ 18
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