Towards Research 4.0 ENRIS2019, University of Twente Christian - PowerPoint PPT Presentation

Towards Research 4.0 ENRIS2019, University of Twente Christian Kjelde, Polyteknik AS www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 1

Outline • Polyteknik AS • Flextura PVD Platform • Towards research 4.0 (Material science and research) • Research 4.0 as a term • Case: Flextura Cluster system for University of Oslo www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 2

Polyteknik AS Denmark We are a local company working globally • Established in 1995 by Mr. Jens William Larsen • State-of-the-art 2000m 2 facility located close to Aalborg, in the northern part of Denmark • Class 1000 clean room • Material characterisation lab for thin film analysis • Highly qualified teams of scientists, process and mechanical engineers (25-30 employee) www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 3

More than 20 years of excellence We are a local company working globally Ferries to Norway • Established in 1995 by Mr. Jens William Larsen Ferries to Sweden Polyteknik AS • State-of-the-art 2000m 2 facility located close to Aalborg, in the northern part of Denmark Aalborg - AAL airport to rest of world • Class 1000 clean room • Material characterisation lab for thin film analysis • Highly qualified teams of scientists, process and Copenhagen mechanical engineers (25-30 employee) CPH Airport www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 4

Business Areas Design, Manufacture, Software Process, Service & Maintenaince Consumables & spare parts Coating service for general industry Coating development & Proof-of-concept Supply chain sourcing Accellerators & Syncrotrons Fusion Energy www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 5

Our standard PVD system platforms Discovery Flextura Module Flextura Cluster Tornado www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 6

FLEXTURA PVD – THE MOST FLEXIBLE 200mm PLATFORM www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 7

PROCESS COMBINATIONS OF THE FLEXTURA PVD PLATFORM Thermal processes Sputtering processes • • Heating of substrates up to 1000 °C under deposition or as thermal DC, pulsed DC, Bipolar, RF, HIPIMS • pre- or post processing Metals, alloys, oxides, nitrides. • • Robotic handling of substrates with temperatures up to 500 °C Epitaxial growth of thin films by sputtering Organic deposition E-beam processes • • Low temp Knudsen cell type Generic E-beam configuration • GLAD Glancing Angle Deposition – OAD Oblique Angle Analysis/characterization Deposition • • RHEED High Rate Si deposition with 1000 °C substrate temperature • • UPS/ARUPS Epitaxial growth of Si by E-beam deposition • LEED www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 8

MODULARITY Full-automatic single wafer Manual Full-automatic processing processing via load lock cassette to casette Loading www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 9

Polyteknik software - Cryosoft3 Our unique and user-friendly Cryosoft3 control software increases the quality, throughput and value of your research or production by full data logging and recipe based deposition developments. The system is based on a strong Beckhoff PLC.  System can run in fully automatic or manual mode.  Software can contain up to 100 recipes.  Multi-layer programming integrated in the software.  Push-button in software for manual start of deposition, after automatic pump down cycles.  High up-time and user-friendly also with multiple users.  Remote access for system observation and control (vacuum pressure, valves, mass flow control, pumps, gas control, shutters, RF and DC generators, etc. www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 10

RGA for process control A RGA provides an essential and valuable picture of the global gas composition within the process chamber. Software integrated feedback loop in Cryosoft3 utilise these data for: • Base pressure quality control - Footprint • In-situ dynamic regulation of process for stable and repeatable depositions in reactive processes. • Wide pressure working range up to 10 -2 mbar range. Used for process and quality control, fault detection. www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 11

Precise controlled reactive sputtering with PEM Dynamic Plasma Emission Control Dynamic reactive magnetron sputtering by integration of feedback for control of gas flow and power into our Cryosoft3 control software to give: • Stabile plasma composition • Stabile deposition rate • Stabile stoichiometry EMICON MC system incl. • spectrometer channels (1 per target) • Spectral analysis software Used for process and quality control, fault detection, plasma process diagnostics. www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 12

System status, material consumption etc. www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 13

Towards Research 4.0 Research 4.0 Science 4.0 Open Science 4.0 Research & Development 4.0 SMART RESEARCH! Google: less than 200.000 results Google: About 14.000.000 results www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 14

Towards Research 4.0 Ref: Prof. Dr. Dr. h.c. mult. August-Wilhelm Scheer, Scheer GmbH; AWS Institut für digitale Produkte und Prozesse, Saarbrücken www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 15

Towards Research 4.0 (Material Science) Source: Research and Development 4.0, PWC Strategy& analysis www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 16

FLEXTURA PVD CLUSTER a research 4.0 enabler University of Oslo – www.norfab.no Purpose: Epitaxial growth and analysis of semiconducting oxides First discussions started in 2016 Installed Q1 2019 Delivery time slightly above 1 year Specialities: • +1000 ° C substrate temperatures • Thermal treatment with N 2 , O 2 , H 2 and ”Metal” atmosphere • Remote Plasma Sputtering • DC,RF, HiPIMS (also with remote plasma) • In-system analysis www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 17

Sputtering with PEM Remote plasma sputtering DC, RF, HiPIMS DC, RF, HiPIMS Substrate: 1000 ° C Substrate: 1000 ° C <E-8 mbar <E-8 mbar Central Transfer Chamber Load lock, custom cassette 10 pcs Brooks MAG7S robot and GB (detachable) E-8 mbar Thermal pre/post treatment Substrate: 1000 ° C Analysis/characterisation <E-8 mbar LEED & UPS/ARUPS Upgradeable with XPS <E-9 mbar www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 18

Process and transfer modules www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 19

Analysis Module 10 pcs carriers or wafers with a size of 100mm Fully automated substrate handling – x, rot, tilt Two analysis positions - LEED & UPS Base pressure < E-9mbar www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 20

Why research 4.0? Why automating research? As an example: • Load cassette of 10 or 25 samples in the load lock • Apply individual process recipes for each sample • The system is processing • The system is data-logging the process • The system is characterising • Pick samples including extensive process datalogs and characterisation data. Outcome: • Increased R&D throughput, reliability, quality • Smarter and faster research & development • Fast process parameter scanning and tuning • More reliable and repeatable experiments • More time to plan, discuss, collaborate and interact with colleagues and other research groups • Bridging process development to volume production www.polyteknik.com WHEN THIN FILM MATTERS 21 WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 21

THANK YOU! QUESTIONS? www.polyteknik.com WWW.POLYTEKNIK.COM WHEN THIN FILM MATTERS 22