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The All New The All New Agilent 7700 g Series The Smallest, Most Powerful ICP MS Ever Made Inductively Coupled Plasma Mass Spectrometry ICP MS is a fast, multi element, high sensitivity trace metals analysis technique Key applications


  1. The All New The All New Agilent 7700 g Series The Smallest, Most Powerful ICP ‐ MS Ever Made

  2. Inductively Coupled Plasma Mass Spectrometry ICP ‐ MS is a fast, multi ‐ element, high sensitivity trace metals analysis technique Key applications are: • Environmental • Foods • Semiconductor • Clinical • Chemical/Petrochemical • Pharmaceutical • Consumer Goods Consumer Goods • Forensic • Geological • Nuclear • Academic/Research ICP ‐ MS market continues to grow as technology improves and GFAA and ICP ‐ OES instruments are replaced with ICP ‐ MS

  3. Agilent ICP ‐ MS Instrument Development Agilent 7700 Series The new face of ICP ‐ MS The new face of ICP MS Agilent 4500 Series Agilent 7500 Series

  4. Agilent’s History of Innovation in ICP ‐ MS – 1987 to 2009 1987 – PMS 100 introduced – First computer ‐ controlled ICP ‐ MS p 1988 – PMS 200 introduced – Second generation ICP ‐ MS with off ‐ axis Qpole lens 1989 – 1 st ETV accessory for semicon analysis by ICP ‐ MS 1990 – PMS 2000 introduced – Omega off ‐ axis lens. Lowest random background ICP ‐ MS 1992 – ShieldTorch interface developed ‐ Ar interferences virtually eliminated in cool plasma enabling ppt analysis of K Ca Fe by ICP MS plasma, enabling ppt analysis of K, Ca, Fe by ICP ‐ MS Agilent 4500 Series 1994 – 4500 Series introduced ‐ World's first benchtop system. Hyperbolic profile quad, ShieldTorch System motorized torch XYZ, cool plasma 1998 – First real time ICP ‐ MS chromatographic software – PlasmaChrom. T ‐ mode reaction interface introduced Octopole Reaction Octopole Reaction 1999 – 4500 Series 100, 200 & 300 introduced: 1st applications ‐ specific ICP ‐ MS. System 2000 – Agilent 7500 Series introduced ‐ 7500a, 7500i and 7500s ‐ the next generation in ICP ‐ MS instrumentation. 9 orders detector range 2001 – Agilent 7500c launched – 1 st generation ORS for high matrix samples. 2002 – New digital generators and LAN control introduced First commercial GC ‐ ICP ‐ MS 2002 New digital generators and LAN control introduced. First commercial GC ‐ ICP ‐ MS interface. 2003 – Agilent 7500cs launched – 2 nd generation ORS for high purity semicon samples. Agilent 7500 Series 2004 – Agilent 7500ce launched – 2 nd generation ORS for high matrix samples. 2005 – Low flow cell gas MFC’s for Xe NH 3 , O 2 , etc added to 7500ce/cs. 2006 – Agilent acquires 100% of Agilent/Yokogawa joint venture 2007 – Agilent 7500cx introduced: He only mode ICP ‐ MS 2008 – High Matrix Interface developed – enables 2% TDS samples to be run by ICP ‐ MS 2009 – Agilent 7700 Series introduced – replaces 7500 Series. MassHunter Software introduced ‐ common platform with other Agilent MS. ISIS ‐ DS Discrete sampling introduced common platform with other Agilent MS. ISIS DS Discrete sampling system, for ultra high throughput analysis Agilent 7700 Series

  5. 7700 Series – New Product Highlights New ORS 3 Collision/Reaction Cell New ORS Collision/Reaction Cell � Longer, narrower rods, higher cell pressure and frequency – MUCH better performance in He mode N New RF Generator RF G t � Fast tuning 27MHz generator, for better tolerance to changing matrix (incl. organics) Increased Matrix Tolerance � High Matrix Introduction (HMI) standard on 7700x model Much smaller cabinet � >30% smaller footprint than any other ICP ‐ MS Simple software; reliable Auto ‐ Tuning � MassHunter software – intuitive and easy to learn. Pre ‐ set plasma conditions and p fast lens auto ‐ tuning

  6. Two 7700 Models 7700x 7700x 7700s 7700s • High productivity system • Clean room ready • Third generation ORS • Third generation ORS • HMI • Cool plasma • Environmental, food, clinical, • Mineral acids, silicon matrices, organics, pharmaceutical and general purpose pharmaceutical and general purpose DIW DIW, process chemicals h i l applications

  7. Agilent 7700 ICP ‐ MS System in Detail 3 rd generation g Off axis ion lens Off ‐ axis ion lens Octopole Reaction Cell gas inlet System (ORS 3 ) High matrix Fast, simultaneous introduction dual mode (HMI) dilution detector (9 orders gas inlet gas inlet dynamic range) d i ) Low ‐ flow Sample Introduction High ‐ frequency (3MHz) hyperbolic quadrupole Peltier ‐ cooled spray chamber p y High ‐ performance vacuum system Fast, frequency ‐ matching 27MHz High ‐ transmission, RF generator matrix tolerant matrix tolerant interface

  8. Inorganic Analysis Techniques in a Typical Laboratory % ICP ‐ OES – for majors and high matrix samples Multi ‐ element, ~2 min/ sample 10’s ppb to 1000’s ppm ICP ‐ MS – for trace elements and clean samples f l d l l Multi ‐ element, ~4min/ sample ppm Single ppt to 10’s ppm LOD GFAAS In many inorganic labs, several analytical Single Hydride/AFS techniques are used, to cover the range element, ppb pp Few elements, , ~6min/ 6min/ of analytes, matrices and detection f l i d d i ~2min/ sample limits required. This is encouraged by sample 10’s ppt to some vendors, who want to sell multiple Single ppt to 100’s ppb 10’s ppb instruments to each lab! ppt Many Elements/Samples Many Elements/Samples Few Elements/Samples Few Elements/Samples

  9. Inorganic Analysis Techniques in a Typical Laboratory % ICP ‐ OES 7700 ICP-MS Multi ‐ element, ~2 min/ sample Multi-element 10’s ppb to 1000’s ppm 10’ b t 1000’ ICP ‐ MS – for trace elements and clean samples f l d l l Single cell gas mode and productivity tools reduce run time Multi ‐ element, ~4min/ sample ppm HMI for samples with % level solids Single ppt to 10’s ppm Single ppt (incl. hydride and Hg) to 100’s ppm (1000’s ppm with HMI) ith HMI) LOD GFAAS Single Hydride/AFS element, Uniquely, the Agilent 7700 can q y, g pp ppb Few elements, , ~6min/ 6min/ ~2min/ replace all these separate techniques, sample sample providing high throughput, matrix 10’s ppt to Single ppt to 100’s ppb tolerance, wide elemental coverage 10’s ppb and low LODs in a single run ppt Many Elements/Samples Many Elements/Samples Few Elements/Samples Few Elements/Samples

  10. 7700 ‐ Smaller Cabinet; Longer Ion Path!! The 7700 has >30% smaller footprint than any other ICP MS but The 7700 has >30% smaller footprint than any other ICP ‐ MS, but access for maintenance has been improved (all service from front) Despite much smaller external cabinet size, the ion path of the 7700 i is actually 30mm longer than the 7500 ll 30 l h h 7500 Extra length due to redesigned cell (longer octopole rods) and lens 30% smaller footprint 30mm longer ion path

  11. Unique Performance of the 7700 Better matrix tolerance than any other ICP ‐ MS • Higher plasma temperature (lower CeO/Ce ratio) under standard conditions than any other system y y Best performance with Helium cell gas – eliminates need for reaction gases in all common applications � 7700 ORS 3 improvements ‐ removes all � 7700 ORS improvements removes all polyatomics in He mode, giving accurate results in complex or variable sample types – impossible on ICP ‐ MS systems that use reactive cell gases or mixtures i ll i Wider dynamic range than any other quadrupole ICP ‐ MS q p � Full 9 orders dynamic range at the detector – linear to 500ppm without changing conditions or hardware

  12. 7700 Series Sample Introduction • Low ‐ flow (typically 0.15mL/min) • Temperature stabilized (Peltier cooled spray chamber) p y ) • Wide Torch Injector ID (2.5mm) • No O ‐ rings in spray chamber end ‐ cap – reduced risk of contamination cap – reduced risk of contamination • Auto ‐ alignment of torch after maintenance • Fast frequency ‐ matching RF F f hi RF generator • Simple setup, using “pre ‐ set” plasma conditions and auto ‐ tuning l d d Provides most robust plasma of any ICP ‐ MS under standard conditions

  13. All New RF Generator The new RF generator of The new RF generator of the 7700 operates using a unique computer controlled fast tuning design to instantly match design, to instantly match to changing load. This means that the 7700 can switch from pure water to volatile organics without disturbing the plasma

  14. Interface area

  15. Comparison of Plasma Loading/Cooling ICP ‐ MS plasma must produce ICP MS plasma must produce Hottest part of Sample channel is p Residence time is a plasma ~ 8000K at ~6700K few milliseconds ions – neutral atoms cannot By sample cone, analytes be measured (unlike ICP ‐ OES present as M + ions where many of the best + emission lines are atomic) Highest M + population Sample introduction must should correspond to lowest polyatomic maintain high plasma population temperature – monitored using CeO + /Ce + ratio Particles are decomposed Aerosol is Dried Atoms are formed and dissociated and then ionised Conventional ICP ‐ MS Conventional ICP MS Optimized ICP ‐ MS (7700) Optimized ICP ‐ MS (7700) 0.5 ‐ 1.0mL/min, 1.8 ‐ 2.0 mm Injector, no water vapor 0.10 ‐ 0.25mL/min, 2.5mm Injector, water vapor removal � Low central channel temperature removed � High central channel temperature + + + + + + + + + + + + + + + High sample load, narrow central channel Low sample load, wide central channel � poor matrix decomposition � good matrix decomposition

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