High-Resolution RBS System (HRBS-V500 HRBS1000) KOBE STEEL, LTD - PowerPoint PPT Presentation

1/15 High-Resolution RBS System (HRBS-V500 、 HRBS1000) KOBE STEEL, LTD ． Machinery & Engineering Company Advanced Product & Technologies Dept. Outline ・ History for RBS Equipment ・ Hardware of HRBS-V500 ・ Principle of RBS ・ Principle of High-Resolution RBS ・ Examples of High-Resolution RBS ・ Principle & Examples of High-Resolution ERDA ・ Principle of PIXE ・ Comparison of instrumentation

2/15 History for RBS Equipment

4/15 Principle of RBS 1 0 0 0 0 Si He + Si 1 0 0 0 d l 1 0 0 e i Y 1 0 Sample1 1 0 1 0 0 2 0 0 3 0 0 4 0 0 5 0 0 c h a n n e l Au 1 0 0 0 0 He + Si Si Au 1 0 0 0 d l 1 0 0 e i Y 1 0 Sample2 1 0 1 0 0 2 0 0 3 0 0 4 0 0 5 0 0 c h a n n e l Au 1 0 0 0 0 He + Si Si Au Si 1 0 0 0 d l 1 0 0 e i Y Sample3 1 0 1 0 1 0 0 2 0 0 3 0 0 4 0 0 5 0 0 c h a n n e l

11/15 Comparison between conventional ERDA & HERDA Comparison by DLC(Diamond like Carbon) spectrum between conventional ERDA & HERDA 1MeV He + → DLC 500keV N + → DLC mikro-i HRBS500 High Resolution ERDA Conventional ERDA Depth resol Depth resolution < 0.2nm tion < 0.2nm Hydrogen Hydrogen depth depth profile in thin profile in thin film w film was C CLEARLY measured!! Y measured!!

14/15 Principle of PIXE(Particle Induced X-ray Emission) When Ion collides with atom, it radiates charasteristic X-ray which is unique in each element. By detecting this X-ray, it turns out what elements and how many elements are included. The feature of PIXE is high detection sensivity which is about ppm order. L-Xray α β β L α α K-Xray M K α L β L γ K K β K L L M β Ion α M Electron

15/15 Comparison of instrumentation(evaluation of thin film) R B S P r i n c i p l e S I M S A E S T E M S T M X R R H R B S 5 0 0 O l d R B S M e t h o d D o u b l e S e m i c o n d u c C r o s s S c a n n i n g X R a y / F e a t u r e f o c u s s i n g t o r S e c t i o n T u n n e l R e f l e c t i o n m a g n e t & M C P d e t e c t o r e l e c t r o n P r o b e 5 0 0 k e V H e 1 M e v H e C s / O i o n e l e c t r o n e l e c t r o n n e e d l e H i g h P o w e r X R a y X 線反射率 D e t e c t i o n S e c o n d a r y A u g e r T r a n s m i s s i o n T u n n e l S c a t t e r e d i o n P a r t i c l e i o n e l e c t r o n e l e c t r o n c u r r e n t 干渉振動 ○ ○ × × × ◎ ◎ n o n - d e s t r u c t i v e D e p t h 0 . 2 ～0 . 3 n m 1 0 n m 5 n m 2 n m 0 . 0 1 n m × 2 ～1 0 n m r e s o l u t i o n C o m p o s i t i o n ◎ ◎ ○ △ △ × × S e n s i t i v i t y 1 % 0 . 5 0 % 0 . 5 0 % F e w % F e w % F e w % 0 . 0 0 0 1 % R e l i a b i l i t y ◎ ◎ △ △ △～☆ ○ △ U s e r - f r i e n d l y ○ ○ △ ○ △ ○ ○ A t t e n t i o n i s A t t e n t i o n i s S e n s i v i t y P r e p a r a t i o n o f C h a r g e u p S i m p l i c i t y o f n e e d e d f o r n e e d e d f o r a d j u s t m e n t i s s a m p l e i s m e a s u r e i s u s e s u r f a c e s u r f a c e n e e d e d n e e d e d n e e d e d t r e a t m e n t t r e a t m e n t